Multiscale Materials Modeling Group
Universidad de Valladolid
Technology Computer Assisted Design (TCAD) is nowadays routinely used in all areas of engineering as it greatly reduces cost and time in the development of new products and processes. We use a multiscale approach to provide the physics foundation needed for predictive models and the efficiency required for a rapid turnaround to support technology development.
Our fundamental research in the topics of irradiation of solids, sputtering, defect properties, dopant-defect interactions, strain effects in amorphous matrix, regrowth kinetics, etc have technology relevant applications in the ion implantation and annealing processes for ultra-shallow junction formation in silicon devices, defect removal in millisecond thermal processing, FinFET doping and regrowth, defect engineering, doping efficiency of amorphous films, patterning for nanostructures, erosion of nuclear reactors or plasma walls.